Power circuit and power module using MISFET having control circuit disposed between gate and source

ABSTRACT

The power circuit includes: a main substrate; a first electrode pattern disposed on the main substrate and connected to a positive-side power terminal P; a second electrode pattern disposed on a main substrate and connected to a negative-side power terminal N; a third electrode pattern disposed on the main substrate and connected to an output terminal O; a first MISFET Q1 of which a first drain is disposed on the first electrode pattern; a second MISFET Q4 of which a second drain is disposed on the third electrode pattern; a first control circuit (DG1) connected between a first gate G1 and a first source S1 of the first MISFET, and configured to control a current path conducted from the first source towards the first gate.

CROSS REFERENCE TO RELATED APPLICATIONS

This is a continuation application (CA) of PCT Application No.PCT/JP2014/84292, filed on Dec. 25, 2014, which claims priority to JapanPatent Application No. P2013-268787 filed on Dec. 26, 2013 and is basedupon and claims the benefit of priority from prior Japanese PatentApplications P2013-268787 filed on Dec. 26, 2013 and PCT Application No.PCT/JP2014/84292, filed on Dec. 25, 2014, the entire contents of each ofwhich are incorporated herein by reference.

FIELD

The embodiment described herein relates to a power circuit and a powermodule.

BACKGROUND

In half bridge circuits, when a switching element of a one-sided armturns on from a dead time state, there is a phenomenon in which gateerroneous turning-on occurs (misfiring (erroneous firing)) inanother-sided switching element caused by a drain voltage change. Thisis a problem which can occur in three phase inverter circuits,synchronous-rectification DC/DC converters, etc., for example, used formotor driving.

On the other hand, many research institutions are currently conductingresearch to develop Silicon Carbide (SiC) devices. Advantages of SiCpower devices over Si power devices include low on resistance, highswitching speed, high temperature operation, etc.

Moreover, if an energy stored in a negative direction in a capacitancebetween gate and source resonates when a short-circuit current due tothe gate erroneous turning-on converges, re-erroneous turning-on(oscillation) will be caused, and then gate surge and drain surgevoltages at that time not only can break down the switching element, butcan become a noise source.

Extreme high-speed operation is limited since a portion shared betweensignal wiring and power wiring is in source wiring when forming a bridgewith a discrete device and therefore a gate signal is reduced due toelectrification of the source wiring.

On the other hand, in power modules in which gate signal wiring andsource signal wiring become longer by separating the signal wiring andthe power wiring from each other using source sense wiring and byconnecting in parallel a semiconductor chip in order to allow largecapacities, since it does not receive an inhibition of gate driving dueto electrification of the source wiring if using a switching elementwhich performs high-speed operation, the occurrence of erroneousturning-on and an oscillation triggered by the erroneous turning-on isin particular a problem, and is also an important problem which shouldbe avoided in particular.

SUMMARY

The embodiment provides a power circuit capable of reducing amisoperation and a parasitic oscillation and further capable ofrealizing high speed switching performance, and a power module in whichsuch a power circuit is mounted.

According to one aspect of the embodiment, there is provided a powercircuit comprising: a main substrate; a first electrode pattern disposedon the main substrate, the first electrode pattern connected to apositive-side power terminal; a second electrode pattern disposed on themain substrate, the second electrode pattern connected to anegative-side power terminal; a third electrode pattern disposed on themain substrate, the third electrode pattern connected to an outputterminal; a first MISFET in which a first drain is disposed on the firstelectrode pattern; a second MISFET in which a second drain is disposedon the third electrode pattern; and a first control circuit connectedbetween a first gate and a first source of the first MISFET, the firstcontrol circuit configured to control a current path conducted from thefirst source towards the first gate.

According to another aspect of the embodiment, there is provided a powermodule comprising a power circuit, wherein the power circuit comprises:a main substrate; a first electrode pattern disposed on the mainsubstrate, the first electrode pattern connected to a positive-sidepower terminal; a second electrode pattern disposed on the mainsubstrate, the second electrode pattern connected to a negative-sidepower terminal; a third electrode pattern disposed on the mainsubstrate, the third electrode pattern connected to an output terminal;a first MISFET in which a first drain is disposed on the first electrodepattern; a second MISFET in which a second drain is disposed on thethird electrode pattern; and a first control circuit connected between afirst gate and a first source of the first MISFET, the first controlcircuit configured to control a current path conducted from the firstsource towards the first gate.

According to the embodiment, there can be provided the power circuitcapable of reducing the misoperation and the parasitic oscillation andfurther capable of realizing the high speed switching performance; andthe power module in which such a power circuit is mounted.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a schematic circuit configuration diagram of a half bridgecircuit, which is a power circuit according to a first embodiment.

FIG. 2 is a schematic cross-sectional structure diagram of SiC DIMISFET,in an example of a semiconductor device applicable to the power circuitaccording to the first embodiment.

FIG. 3 is a schematic cross-sectional structure diagram of SiC TMISFET,in an example of the semiconductor device applicable to the powercircuit according to the first embodiment.

FIG. 4A is a schematic diagram of a p body region 28 and an n⁻ driftlayer 26 of the Si MISFET, in a comparison between an Si device and anSiC device.

FIG. 4B is a schematic diagram of a p body region and an n drift layerof the SiC MISFET, in the comparison between the Si device and the SiCdevice.

FIG. 4C is a comparative diagram between field intensity distributionsrespectively corresponding to FIGS. 4A and 4B, in the comparison betweenthe Si device and the SiC device.

FIG. 5A is an explanatory diagram of a parasitic effect of thesemiconductor device applicable to the power circuit according to thefirst embodiment.

FIG. 5B is an explanatory diagram of an oscillatory waveform of avoltage V_(ds) between the drain and the source of the semiconductordevice applicable to the power circuit according to the firstembodiment.

FIG. 6A is an explanatory diagram of a parasitic effect between the gateand the source of the SiC MISFET applicable to the power circuitaccording to the first embodiment.

FIG. 6B is an explanatory diagram of a distributed transmission linecircuit between the gate and the source of the SiC MISFET applicable tothe power circuit according to the first embodiment.

FIG. 6C is an equivalent circuit diagram of the distributed transmissionline circuit between the gate and the source of the SiC MISFETapplicable to the power circuit according to the first embodiment.

FIG. 7 is a circuit diagram for explaining an oscillation phenomenon inthe power circuit according to the first embodiment.

FIG. 8 shows a waveform example voltages (V_(gs),H), (V_(gs),L) betweenthe gate and the source sense, a waveform example of voltages(V_(ds),H), (V_(ds),L) between the drain and the source, and a waveformexample of drain currents (I_(d),H), (I_(d),L), after applying the gatedrive voltage in the configuration shown in FIG. 7.

FIG. 9 is a schematic circuit configuration diagram of a three-phasealternating current (AC) inverter for driving three-phase motor to whichthe power circuit according to the first embodiment can be applied.

FIG. 10A is a circuit diagram for explaining a trigger for oscillationin the oscillation phenomenon, in the power circuit according to thefirst embodiment.

FIG. 10B is a circuit diagram for explaining an energy supply sourceduring the oscillation, in the power circuit according to the firstembodiment.

FIG. 11A is a circuit diagram for explaining an operation simulationwhen not connecting a gated diode as a control circuit thereto, in thepower circuit according to the first embodiment.

FIG. 11B shows a waveform example of voltages (V_(gs),H) (V_(gs),L)between the gate and the source sense, a waveform example of voltages(V_(ds), H), (V_(ds),L) between the drain and the source, and a waveformexample of drain currents (I_(d),H), (I_(d),L), in FIG. 11A.

FIG. 12 is a circuit diagram for explaining an operation simulation whenconnecting the gated diode as a control circuit thereto, in the powercircuit according to the first embodiment.

FIG. 13A shows a waveform example of voltages (V_(gs),H), (V_(gs),L)between the gate and the source sense, a waveform example of voltages(V_(ds),H), (V_(ds),L) between the drain and the source, and a waveformexample of drain currents (H), (I_(d),L), in FIG. 12.

FIG. 13B shows a waveform example (solid line) of a voltage (V_(gs),H)between the gate and the source sense when connecting the gated diode asa control circuit thereto, and a waveform example (dashed line) of avoltage (V_(gs),H) between the gate and the source sense when notconnecting the gated diode thereto.

FIG. 14A is a circuit diagram for explaining an operation simulationwhen a transistor Q_(M1) for active mirror clamp is short-circuitedbetween the gate and the source of a first MISFET Q1 at a reflux side(high side), in the power circuit according to the first embodiment.

FIG. 14B shows a waveform example of voltages (V_(gs),H), (V_(gs),L)between the gate and the source sense, a waveform example of voltages(V_(ds),H), (V_(ds),L) between the drain and the source, and a waveformexample of drain currents (I_(d),H), (I_(d),L), in FIG. 14A.

FIG. 15 is a schematic planar pattern configuration diagram beforeforming a resin layer in a 2-in-1 module (module with a built-inhalf-bridge), in the power module according to the first embodiment.

FIG. 16 is a schematic bird's-eye view configuration diagram afterforming the resin layer in the module with a built-in half-bridge, inthe power module according to the first embodiment.

FIG. 17 is a schematic bird's-eye view configuration diagram beforeforming the resin layer and after forming an upper surface plateelectrode in the module with the built-in half-bridge, in the powermodule according to the first embodiment.

FIG. 18 is a schematic planar pattern configuration diagram beforeforming the resin layer in the module with the built-in half-bridge, inthe power module according to a modified example 1 of the firstembodiment.

FIG. 19 is a schematic bird's-eye view configuration diagram of a modulewith a built-in half-bridge, in the power module according to a modifiedexample 1 of the first embodiment.

FIG. 20 is a schematic circuit configuration diagram of a half bridgecircuit, in a lower circuit according to a second embodiment.

FIG. 21A is an operation circuit explanatory diagram of an active mirrorclamp applied as a control circuit, in the power circuit according tothe second embodiment.

FIG. 21B is an explanatory diagram of operation waveform in FIG. 21A.

FIG. 22 is a schematic circuit configuration diagram of the half bridgecircuit, in the power circuit related to a modified example of thesecond embodiment.

FIG. 23 is an operation circuit explanatory diagram of the active mirrorclamp applied as a control circuit, in the power circuit according tothe modified example of the second embodiment.

FIG. 24 is a schematic circuit configuration diagram of a half bridgecircuit, in a power circuit according to a third embodiment.

FIG. 25 is a top view diagram before forming the resin layer in themodule with the built-in half-bridge, in the power module according tothe third embodiment.

FIG. 26 is a top view diagram before forming the resin layer in themodule with the built-in half-bridge, in the power module according to amodified example 1 of the third embodiment.

FIG. 27 is a schematic circuit configuration diagram of the half bridgecircuit corresponding to FIG. 26, in the power circuit according to amodified example 1 of the third embodiment.

FIG. 28 is a top view diagram before forming the resin layer in themodule with the built-in half-bridge, in the power module according to amodified example 2 of the third embodiment.

FIG. 29 is a schematic circuit configuration diagram of the half bridgecircuit corresponding to FIG. 28, in the power circuit according to themodified example 2 of the third embodiment.

FIG. 30 is a schematic cross-sectional structure diagram of a ceramicsubstrate and a signal substrate disposed on the ceramic substrate, in asubstrate structure applied to the power module according to the firstto third embodiments.

FIG. 31 is a schematic cross-sectional structure diagram of a ceramicsubstrate, and a signal substrate which is disposed on the ceramicsubstrate and includes a shield layer therein, in the substratestructure applied to the power module according to the first to thirdembodiments.

FIG. 32 is a schematic cross-sectional structure diagram of a ceramicsubstrate, and a signal substrate which is disposed on the ceramicsubstrate via a shield metallic plate and has a shield layer therein, inthe substrate structure applied to the power module according to thefirst to third embodiments.

FIG. 33A is a circuit configuration diagram composed of a discretedevice, in a power circuit according to a fourth embodiment.

FIG. 33B is a plane configuration diagram of the power modulecorresponding to FIG. 33A.

FIG. 34A is a schematic bird's-eye view configuration diagram composedof a hybrid device, in a power module according to a modified example ofthe fourth embodiment.

FIG. 34B is a schematic cross-sectional structure diagram of a structureportion in which the diode is mounted on a semiconductor device (SiCTMISFET), in the power module according to the modified example of thefourth embodiment.

DESCRIPTION OF EMBODIMENTS

Next, certain embodiments will be described with reference to drawings.In the description of the following drawings, the identical or similarreference numeral is attached to the identical or similar part. However,it should be noted that the drawings are schematic and the relationbetween thickness and the plane size and the ratio of the thickness ofeach component part differs from an actual thing. Therefore, detailedthickness and size should be determined in consideration of thefollowing explanation. Of course, the part from which the relation andratio of a mutual size differ also in mutually drawings is included.

Moreover, the embodiments described hereinafter merely exemplify thedevice and method for materializing the technical idea; and theembodiments do not specify the material, shape, structure, placement,etc. of each component part as the following. The embodiments may bechanged without departing from the spirit or scope of claims.

First Embodiment Power Circuit

FIG. 1 shows a schematic circuit configuration of a half bridge circuit,in a power circuit 1 according to a first embodiment. Moreover, FIG. 15shows a schematic planar pattern configuration before forming a resinlayer 120 in a 2-in-1 module (module with the built-in half-bridge), ina power module 2 in which the power circuit 1 according to the firstembodiment is mounted. Note that the power circuit 1 according to thefirst embodiment is not limited to such a half bridge circuit, but canbe applied also to a full bridge circuit or a three-phase bridgecircuit.

As shown in FIGS. 1 and 15, the power circuit 1 according to the firstembodiment is a circuit in which a plurality ofMetal-Insulator-Semiconductor Field Effect Transistors (MISFETs) areincluded, and drains D1, D4 of a first MISFET Q1 and a second MISFET Q4are electrically connected on a main substrate 10 including electrodepatterns 12 ₁, 12 _(n), 12 ₄. The power circuit 1 according to the firstembodiment simultaneously includes gates G1, G4, source senses SS1, SS4,a gate terminal GT1 for external extraction, a source sense terminalSST1, and power terminals P, N; and includes a first control circuit forcontrolling at least a current path conducted from the first source S1towards the first gate G1 of the first MISFET Q1.

More particularly, as shown in FIGS. 1 and 15, the power circuit 1according to the first embodiment includes: a main substrate 10; a firstelectrode pattern 12 ₁ disposed on the main substrate 10 and connectedto a positive-side power terminal P; a second electrode pattern 12 _(n)disposed on the main substrate 10 and connected to a negative-side powerterminal N; a third electrode pattern 12 _(n) disposed on the mainsubstrate 10 and connected to an output terminal O; a first MISFET Q1 inwhich a first drain D1 is disposed on the first electrode pattern 12 ₁;a second MISFET Q4 in which a second drain D4 is disposed on the thirdelectrode pattern 12 ₄; and a first control circuit connected between afirst gate G1 and a first source S1 of the first MISFET Q1, the firstcontrol circuit configured to control a current path conducted from thefirst source S1 towards the first gate G1.

The power circuit 1 according to the first embodiment further mayinclude a second control circuit connected between the second gate G4and the second source S4 of the second MISFET Q4, the second controlcircuit configured to control a current path conducted from the secondsource S4 towards the second gate G4.

In this embodiment, the first control circuit includes: a first gateddiode D_(G1) of which a cathode is connected to the first gate G1 and ananode is connected to the first source S1.

Moreover, the second control circuit includes: a second gated diodeD_(G4) of which a cathode is connected to the second gate G4 and ananode is connected to the second source S4.

Moreover, as shown in FIGS. 1 and 15, in the power circuit 1 accordingto the first embodiment, a part of the electrode patterns 12 ₁, 12 ₄ maybe disposed on signal substrates 14 ₁, 14 ₄ different from the mainsubstrate 10, the signal substrates 14 ₁, 14 ₄ may be disposed on themain substrate 10, and the control circuit may be disposed on the signalsubstrates 14 ₁, 14 ₄. By adopting such a configuration, the controlcircuit becomes difficult to receive an effect of instantaneous heatgeneration of the transistor, and thereby can avoid a misoperation.

More particularly, as shown in FIG. 15, the power circuit 1 according tothe first embodiment may include a first signal substrate 14 ₁ disposedon the main substrate 10, the first signal substrate 141 in which asignal wiring pattern GL1 for first gate connected to the first gate G1and a signal wiring pattern SL1 for first source sense connected to thefirst source S1 are mounted thereon.

Moreover, as shown in FIG. 15, the power circuit 1 according to thefirst embodiment may include a second signal substrate 14 ₄ disposed onthe main substrate 10, the second signal substrate 144 in which a signalwiring pattern GL4 for second gate connected to the second gate G4 and asignal wiring pattern SL4 for the second source sense connected to thesecond source S4 are mounted thereon.

In this embodiment, as shown in FIG. 15, the first control circuit mayinclude a first gated diode D_(G1) connected between the signal wiringpattern GL1 for first gate and the signal wiring pattern SL1 for firstsource sense. As for these patterns, it is preferable to reduce aparasitic inductance by having parallel or face-to-face disposition witheach other.

Moreover, as shown in FIG. 15, the second control circuit may include asecond gated diode DG4 connected between the signal wiring patternG_(L4) for second gate and the signal wiring pattern SL4 for secondsource sense.

Moreover, it is effective to set up a circuit constant also by takinginto consideration a parasitic inductance of wiring from the firstMISFET to the first gated diode so that a forward voltage when the firstgated diode D_(G1) is conducting becomes lower than a negative-sideabsolute maximum rating of the voltage between the gate and the sourcein the first MISFET. Similarly, it is effective to set up a circuitconstant also by taking into consideration a parasitic inductance ofwiring from the second MISFET to the second gated diode so that aforward voltage when the second gated diode D_(G4) is conducting becomeslower than a negative-side absolute maximum rating of the voltagebetween the gate and the source in the second MISFET.

In the power circuit 1 according to the first embodiment, voltage isapplied between the gate and the source in the first MISFET for theamount of the forward voltage drop of the first gated diode D_(G1) in agate-negative direction. Accordingly, a dielectric breakdown can beprevented by designing the on-characteristics of the first gated diodeD_(G1).

Moreover, a Zener diode or a Schottky Barrier Diode (SBD) is applicable,as the first gated diode D_(G1). Similarly, such a Zener diode or SBD isalso applicable as the second gated diode D_(G4).

As the first gated diode D_(G1), although a voltage applied in thegate-negative direction becomes slightly higher since the forwardvoltage is higher if the Zener diode is applied thereto, a voltageapplied in the gate-negative direction becomes lower since the forwardvoltage is lower if the Schottky barrier diode is applied thereto, andthereby coping therewith will be easy.

More specifically, the forward voltage when the first gated diode D_(G1)is conducting needs to be lower than a gate breakdown voltage of thevoltage between the gate and the source in the first MISFET. A value ofnegative-side absolute maximum rating of the voltage between the gateand the source in the first MISFET is approximately 6V, for example.

In the power circuit 1 according to the first embodiment and the powermodule 2 in which such a power circuit 1 is mounted thereon, the gateddiode D_(G1) for reducing a vibration of the voltage between the gateand the source is connected to the gate G1 and source sense SS1 wiringpatterns in which the first MISFET is mounted thereon (anode A isconnected to the source sense SS1 side and the cathode K is connected tothe gate G1 side) (it is important to be disposed inside from the signalterminals GT1, SST1 connected to outside). By connecting gated diodeD_(G1) thereto like such a manner, the vibration and oscillation of thevoltage between the gate and the source in the case of the voltage isapplied to a capacitance between gate and source in the negativedirection can be reduced, stable operation can be obtained, andconfiguration with a simple circuit to be miniaturized can be realized.

In the implementation example shown in FIG. 15, the gated diodes D_(G1),D_(G2) are disposed on the signal substrates 14 ₁, 14 ₄ disposed on themain substrate 10.

As shown in FIG. 1, there are parasitic inductances L_(GP1), L_(SP1)associated with routing of signal terminals GT1, SST1 and electrodewiring, etc. between the signal terminals GT1, SST1 for externalextraction and the gate G1, the source sense SS1 in the first MISFET Q1.Since such an inductance component exists in a gate closed circuit ofthe first MISFET Q1, it causes an operation delay in gate driving of thefirst MISFET Q1, or increase of the voltage variation between the gateand the source sense at the time when the voltage between the drain andthe source is changed.

Although the gated diode D_(G1) is disposed between the gate G1 wiringand the source sense SS1 wiring, the effect becomes higher as thedistance from the cathode K and the anode A in the diode D_(G1) to thegate pad electrode GP and the source pad electrode SP in the firstMISFET Q1 becomes shorter in order to reduce the parasitic effect due tosuch an inductance component. In the present embodiment, the gate padelectrode GP and the source pad electrode SP in the first MISFET Q1 areformed on a front side surface of the first MISFET Q1. Accordingly, evenif the gated diode D_(G1) is built in the same chip as the first MISFETQ1, the anode A of the gated diode D_(G1) chip can also directly besoldered on the source pad electrode SP of the first MISFET Q1.

Moreover, although the gated diode D_(G1) may be disposed collectivelyfor every first MISFET Q1 disposed in parallel, it is more effective toindividually connect the gated diode DG1 to every first MISFET Q1,respectively.

Although, it is important for the gated diode DG1 to be disposed insidefrom the signal terminals G_(T1), SST1 for external extraction havingparasitic inductances L_(GP1), L_(SP1), and it is more effective asnearest to the first MISFET Q1, the effect is expectable even if it isconnected so as to bridge between the terminals or between edge parts ofthe terminals.

However, since temperature becomes higher when connecting the gateddiode D_(G1) directly on the chip of the first MISFET Q1, it ispreferable to compose the gated diode DG1 from wideband gapsemiconductors, e.g. SiC, GaN, etc. with satisfactory high-temperaturecharacteristics.

Although the Zener diode is applicable to the gated diode D_(G1) indisposition, the SBD having the sufficient characteristics, etc. aremore effective since the forward characteristic is utilized.

On the other hand, in the case of applying the Zener diode thereto, itis expected that a clamp function of the positive-direction gate voltagecan be held.

The above-mentioned explanation is the same also as that for the gateddiode DG2.

As explained above, according to the power circuit 1 according to thefirst embodiment, there can be obtained the small-sized half bridgecircuit for reducing the oscillation. Note that it is not limited tosuch a half bridge circuit, but a full bridge circuit or a three-phasebridge circuit can also similarly be applied thereto.

Moreover, any one the first MISFET Q1 or the second MISFET Q2 can becomposed of the SiC MISFET.

SiC can realize low on resistance R_(on) by realizing high concentrationof a thin film and drift layer since the dielectric breakdown electricfield is higher. However, since an expansion width of depletion layerwith respect to the drift layer is limited for the amount thereof and afeedback capacitance C_(rss) is not easily reduced, a ratio ofC_(gs):C_(gd) is smaller and a gate erroneous turning-on operationeasily occurs caused by drain voltage change dV_(ds)/dt, where C_(gs) isthe capacitance between gate and source and C_(gd) is the capacitancebetween the gate and the drain.

The parasitic oscillation can be reduced and high speed switchingperformance can be secured by applying the power circuit 1 according tothe first embodiment thereto.

Moreover, any one of the first MISFET Q1 or the second MISFET Q2 may becomposed of SiC Trench MISFET (SiC TMISFET). In SiC TMISFET, since it isdifficult to set the ratio of C_(gs):C_(gd) larger, the capacity ratioC_(gd)/C_(gs) becomes approximately ½ to 1/20 in regions in which thedrain voltage is not more than 100V, for example. Although a feedbackcapacitance C_(rss) is not further easily decreased since the SiCTMISFET does not include JFET in the current path fundamentally, theparasitic oscillation can be reduced and high speed switchingperformance can be secured by applying the power circuit 1 according tothe first embodiment thereto.

According to the power module 2 including the power circuit 1 accordingto the first embodiment therein, there can be composed a module intowhich the control circuit is also incorporated. Accordingly, a variationin the distance between the control circuit and the MISFET can bereduced, and therefore the effect of the parasitic inductance can becontrolled.

Configuration Example of Semiconductor Device SiC DIMISFET

FIG. 2 shows a schematic cross-sectional structure of SiC DoubleImplanted MISFET (SiC DIMISFET), in an example of the semiconductordevice 100 applicable to the power circuit 1 according to the firstembodiment.

As shown in FIG. 2, the SiC DIMISFET applicable to the power circuit 1according to the first embodiment includes: a semiconductor substrate 26composed of an n⁻ type high resistivity layer; a p body region 28 formedon a front surface side of the semiconductor substrate 26; an n⁺ sourceregion 30 formed on a front side surface of the p body region 28; a gateinsulating film 32 disposed on a front side surface of the semiconductorsubstrate 26 between the p body regions 28; agate electrode 38 disposedon the gate insulating film 32; a source electrode 34 connected to thesource region 30 and the p body region 28; an n⁺ drain region 24disposed on a back side surface opposite to the surface of thesemiconductor substrate 26; and a drain electrode 36 connected to the n⁺type drain area 24.

In the semiconductor device 100 shown in FIG. 2, the p body region 28and the n⁺ source region 30 formed on the front side surface of the pbody region 28 are formed with double ion implantation (DI), and thesource pad electrode SP is connected to the source region 30 and thesource electrode 34 connected to the p body region 28. A gate padelectrode GP (not shown) is connected to the gate electrode 38 disposedon the gate insulating film 32. Moreover, as shown in FIG. 2, the sourcepad electrode SP and the gate pad electrode GP (not shown) are disposedon an interlayer insulating film 44 for passivation configured to coverthe front side surface of the semiconductor device 100.

As shown in FIG. 2, in the SiC DIMISFET, since a depletion layer asshown with the dashed lines is formed in the semiconductor substrate 26composed of a n⁻ type high resistivity layer inserted into the p bodyregions 28, channel resistance R_(JFET) accompanying the junction typeFET (JFET) effect is formed. Moreover, as shown in FIG. 2, body diodesBD are respectively formed between the p body regions 28 and thesemiconductor substrates 26.

SiC TMISFET

FIG. 3 shows a schematic cross-sectional structure of the SiC TMISFET,in an example of the semiconductor device 100 applicable to the powercircuit 1 according to the first embodiment.

As shown in FIG. 3, the SiC TMISFET applicable to the power circuit 1according to the first embodiment includes: a semiconductor substrate26N composed of an n layer; a p body region 28 formed on a front surfaceside of the semiconductor substrate 26N; an n⁺ source region 30 formedon a front side surface of the p body region 28; a trench gate electrode38TG passing through the p body region 28, the trench gate electrode38TG formed in the trench formed up to the semiconductor substrate 26Nvia the gate insulating layer 32 and the interlayer insulating films44U, 44B; a source electrode 34 connected to the source region 30 andthe p body region 28; an n+ type drain area 24 disposed on a back sidesurface of the semiconductor substrate 26N opposite to the front sidesurface thereof; and a drain pad electrode 36 connected to the n⁺ drainregion 24.

In the semiconductor device 100 shown in FIG. 3, a trench gate electrode38TG passes through the p body region 28, and the trench gate electrode38TG formed in the trench formed up to the semiconductor substrate 26Nis formed via the gate insulating layer 32 and the interlayer insulatingfilms 44U, 44B, and the source pad electrode SP is connected to thesource region 30 and the source electrode 34 connected to the p bodyregion 28. A gate pad electrode GP (not shown) is connected to the gateelectrode 38 disposed on the gate insulating film 32. Moreover, as shownin FIG. 3, the source pad electrode SP and the gate pad electrode GP(not shown) are disposed on an interlayer insulating film 44U forpassivation configured to cover the front side surface of thesemiconductor device 100.

In the SiC TMISFET, channel resistance R_(JFET) accompanying thejunction type FET (JFET) effect as the SiC DIMISFET is not formed.Moreover, the body diode BD is formed between p body region 28 and thesemiconductor substrate 26 and the n+ type drain region 24, in the samemanner as that shown in FIG. 2.

Moreover, a GaN based FET etc. instead of SiC based MISFET are alsoapplicable to the semiconductor chip 100 (Q1, Q4) applied to the powercircuit 1 according to the first embodiment.

Any one of the SiC based power device or GaN based power device isapplicable to the semiconductor device 100 (Q1, Q4) applicable to thepower circuit 1 according to the first embodiment.

Furthermore, a semiconductor of which the bandgap energy is from 1.1 eVto 8 eV, for example, can be used for the semiconductor device 110 (Q1,Q4) applied to the power circuit 1 according to the first embodiment.

Electric Field Distribution

Since the SiC device has high dielectric breakdown electric fields (forexample, being approximately 3 MV/cm, and approximately 3 times of Si),it can secure a breakdown voltage even if a layer thickness of the driftlayer is formed thinner and the impurity concentration thereof is sethigher than those of the Si. FIG. 4A is a schematic diagram of a p bodyregion 28 and an n⁻ drift layer 26 of the Si MISFET, in a comparisonbetween the Si device and the SiC device. FIG. 4B shows a schematicdiagram of the p body region 28 and the drift layer 26N in the SiCMISFET. FIG. 4C shows a field intensity distribution corresponding toFIGS. 4A and 4B.

As shown in FIG. 4C, peak electric field intensity E_(p2) of the SiMISFET can be obtained from a position of the distance X1 measured froma junction interface between the p body region 28 and the n⁻ drift layer26 (i.e., front side surface of the p body region 28). Similarly, peakelectric field intensity E_(p1) of the SiC MISFET can be obtained from aposition of the distance X1 measured from a junction interface betweenthe p body region 28 and then drift layer 26N (i.e., front side surfaceof the p body region 28). Due to a difference between the dielectricbreakdown electric fields, the peak electric field intensity E_(p1) ofthe SiC MISFET can be set up higher than the peak electric fieldintensity E_(p2) of the Si MISFET.

An expansion width of the depletion layer in the Si MISFET is a range ofthe distance X1-X3 measured from the front side surface of the p bodyregion 28. On the other hand, an expansion width of the depletion layerin the SiC MISFET is a range of the distance X1-X2 measured from thefront side surface of the p body region 28. Accordingly, the requiredlayer thickness of the n⁻ drift layer is small, a resistance value ofthe n⁻ drift layer can be reduced due to a merit of both sides ofimpurity concentration and the layer thickness, the on resistance R_(on)can be made low, and thereby the chip area can be reduced (the chip sizecan be reduced). Since the breakdown voltage which may equal to that ofthe Si IGBT can be realized as in the MISFET structure which is aunipolar device, high breakdown voltages and high speed switching can berealized, and thereby reduction of switching power loss can be expected.

On the other hand, there is a demerit of being hard to reduce the outputcapacitance and feedback capacitance since the high concentration andthin-layer (X2<X3) of the drift layers 26, 26N limit the expansion widthof depletion layer.

Furthermore, the demerit in particular appears notably in the SiCTMISFET having no Junction FET (JFET) structure in the current pathfundamentally, and therefore the reduction of on resistance R_(on) andthe ease of the erroneous turning-on are traded off with each other,thereby inhibiting the high-speed response performance of the SiC basedMISFET.

According to the power circuit 1 according to the first embodiment, thephenomenon of the oscillation by which at least one of the transistorsrepeats ON and OFF which cannot be controlled triggered by the switchingoperation except intended operation can be prevented, in the circuitwhere at least one SiC based MISFET is electrically connected thereto.

According to the first embodiment, in particular in the circuit where atleast one SiC based MISFET is electrically connected thereto, there canbe provided the power circuit capable of reducing the parasiticoscillation and further capable of realizing the high speed switchingperformance; and the power module in which such a power circuit ismounted.

Gate Erroneous Turning-On and Drain Surge Voltage

FIG. 5A shows an explanatory diagram of a parasitic effect in thesemiconductor device Q applicable to the power circuit 1 according tothe first embodiment, and FIG. 5B shows an explanatory diagram of anoscillatory waveform of the voltage V_(ds) between the drain and thesource.

In FIG. 5A, reference numeral C_(gs) denotes the capacitance betweengate and source, C_(ds) denotes the capacitance between the drain andthe source, C_(gd) denotes the capacitance between the gate and thedrain, and I_(d) denotes the drain current. The capacitance between thegate and the drain C_(gd) is equal to the feedback capacitance C_(rss)of the semiconductor device Q. Moreover, reference numerals L_(GP),L_(SP) denote parasitic inductances accompanying the gate terminal G andthe source terminal S. As shown in FIG. 5A, in a short circuited statebetween the gate and the source, an inductance component which exists inthe closed circuit between the gate and the source becomesL_(GP)+L_(SP).

Since the parasitic gate resistance and the inductance componentL_(GP)+L_(SP) of the semiconductor device Q exist in the short circuitwiring if the drain voltage V_(ds) changes, in the short circuited statebetween the gate and the source, if a divide value of voltage occursmomentarily in the capacitance C_(gs) between the gate and the source ina transient response and then it exceeds the gate threshold voltage, anerroneous turning-on (misfiring (erroneous firing)) will occur.

The phenomenon in which the gate erroneous turning-on (misfiring(erroneous firing)) occurs resulting from the drain voltage changedV_(ds)/dt occurs easily when the switching element having the smallratio of C_(gs):C_(gd) is operated at high speed switching.

The drain surge voltage ΔV when the drain current is converged isexpressed with −L(d_(Id)/dt), and it becomes the oscillatory waveform asshown in FIG. 5B, and it not only can break down the MISFET but alsobecomes a noise source if the drain surge voltage ΔV is too large. Inthis case, reference numeral L denotes the resultant parasiticinductance of the main circuit part (the half bridge and the powersource supply circuit (whole portion composed of the power supply andthe capacitor)).

FIG. 6A shows an explanatory diagram of a parasitic effect between thegate and the source of the SiC MISFET Q1 applicable to the power circuit1 according to the first embodiment, FIG. 6B shows an explanatorydiagram of a distributed transmission line circuit between the gate andthe source, and FIG. 6C shows an equivalent circuit diagram of thedistributed transmission line circuit between the gate and the source.

Between the gate and the source of the SiC MISFET Q1 applicable to thepower circuit 1 according to the first embodiment, a parasiticinductance L_(GP1) between the gate terminal GT1 and the gate G1, and aparasitic inductance L_(SP1) between the source sense terminal SST1 andthe source sense SS1 exist as an inductance component, and Parasiticcapacitances C_(GP), C_(GP) exist as a capacitance component. Moreparticularly, as shown in FIG. 6B, the inductance components andcapacitance components can be expressed with the distributedtransmission line circuit composed of the distributed gate inductance 1_(gp), the distribution source inductance 1 _(sp), and the distributiongate capacitance C_(gp). More specifically, the distributed transmissionline circuit shown in FIG. 6B corresponds to the equivalent circuitbetween the gate and the source shown in FIG. 6C. Such an equivalentcircuit of the distributed transmission line circuit is disposed betweenthe gate and the source of the SiC MISFET Q1, as shown in FIG. 6A.

Oscillation Phenomenon

FIG. 7 shows a circuit diagram for explaining an oscillation phenomenonwhich is occurred, in the power circuit 1 according to the firstembodiment using the SiC MISFET.

In the configuration of FIG. 7, there is explained a problem of theoscillation which has occurred in an inductive load switching evaluationof the module with the built-in half-bridge using the SiC TMISFET.

As shown in FIG. 7, a power supply voltage E, an electrolytic capacitorC_(E), and a lumped snubber capacitor C1 are connected between thepositive-side power terminal P and the negative-side power terminal N,in the half bridge circuit configuration of the first MISFET Q1 and thesecond MISFET Q4. In the present embodiment, the load inductance L1 isconnected between the drain and the source in the first MISFET Q1 at areflux side (high side), between the gate and the source in the firstMISFET Q1 is short-circuited by a signal terminal portion, and then thegate drive voltage is applied from the gate driver 50 to between thegate and the source in the second MISFET Q4 at a driving side (low side)in a state where the first MISFET Q1 is turned OFF.

In the present embodiment, the power supply voltage E is 100V, the loadinductance L1 is 500 μH, the gate drive voltage is 18V/0V, and theexternally connected gate resistance is 0Ω.

FIG. 8 shows a waveform example of voltages (V_(gs),H), (V_(gs),L)between the gate and the source sense, a waveform example of voltages(V_(ds),H), (V_(ds),L) between the drain and the source, and a waveformexample of the drain currents (I_(d),H) (I_(d),L), after applying thegate drive voltage, on the above-mentioned conditions. In FIG. 8, thevoltages (V_(gs),H), (V_(gs),L) between the gate and the source senseare 20V/div, voltages (V_(ds),H), (V_(ds),L) between the drain and thesource are 100V/div, and drain currents (I_(d),H), (I_(d),L) are 50A/div.

In the present embodiment, V_(gs) H denotes a voltage between the gateand the source sense in the first MISFET Q1 at a high side, and V_(gs),Ldenotes a voltage between the gate and the source sense in the secondMISFET Q4 at a low side. Moreover, V_(ds),H denotes a voltage betweenthe drain and the source in the first MISFET Q1 at the high side, andV_(ds),L denotes a voltage between the drain and the source in thesecond MISFET Q4 at the low side. Moreover, I_(d),H denotes a draincurrent in the first MISFET Q1 at the high side (direction from thesource to the drain), and I_(d),L denotes a drain current in the secondMISFET Q4 at the low side (direction from the drain to the source).

As shown in FIG. 8, a phenomenon (oscillation) in which the gate in thefirst MISFET Q1 at the high side which should continue OFF repeats ONand OFF not be intended has occurred at the time when the second MISFETQ4 at the low side is ON. Although such a phenomenon indicates differentwaveforms in accordance with the parasitic inductances and the parasiticcapacitances of each part of the inside of circuit, it is intended forthe whole phenomenon which has occurred due to the same cause,regardless of a shape of each waveform. Moreover, a surge voltage equalto or greater than twice to four times of the power supply voltageE=100V is applied to the voltage (V_(ds),H) between the drain and thesource in the first MISFET Q1 at the high side, and it will easily leadto a device breakdown if the power supply voltage E is higher.

Moreover, since I_(d),H denotes a drain current in the first MISFET Q1at the high side (direction from the source to the drain), and I_(d),Ldenotes a drain current in the second MISFET Q4 at the low side(direction from the drain to the source), the short-circuit currentbetween high-side and low-side arms between the first MISFET Q1 at thehigh side and the second MISFET Q4 at the low side are observed, asshown in FIG. 8.

Target Power Supply Circuit

The power module in which the power circuit 1 according to the firstembodiment is mounted is applicable to a module for a power supplycircuits in which bridge structures, e.g. a half bridge circuit, a fullbridge circuit, or a three-phase bridge circuit, is built. A two-phaseinverter can be composed for the full bridge circuit, a three-phase ACinverter can be composed for the three-phase bridge circuit, and thesame configuration is realized also by using a plurality of the halfbridge circuits.

FIG. 9 shows a schematic circuit configuration of a three-phase ACinverter to which the power circuit 1 according to the first embodimentusing the SiC MISFET can be applied.

As shown in FIG. 9, the three-phase AC inverter includes a gate driver50, a power module unit 52 connected to the gate driver 50, and athree-phase AC motor 54. U-phase, V-phase, and W-phase inverters arerespectively connected to the three-phase AC motor 54 so as tocorrespond to U phase, V phase, and W phase of the three-phase AC motorunit 54, in the power module unit 52. In the present embodiment, thegate driver 50 is connected to SiC MISFETs Q1, Q4, SiC MISFETs Q2, Q5and Q3, Q6.

As for the power module unit 52, the SiC MISFETs (Q1, Q4), (Q2, Q5) and(Q3, Q6) having the inverter configuration are connected between thepositive-side power terminal P and the negative-side power terminal N towhich the power supply voltage E is connected. Furthermore, diodes (notshown) are connected inversely in parallel to one another between thesource and the drain of the SiC-MOSFETs Q1 to Q6.

In the configuration of FIG. 9, there is explained a problem of anoscillation which has occurred in the power module for three-phase ACinverter using the SiC MISFET.

Also in the configuration shown in FIG. 9, the same problem of theoscillation as the phenomenon explained in FIGS. 7 and 8 can occur. Morespecifically, in the state where the switching elements of the firstMISFET Q1 at the high side and the second MISFET Q4 at the low side inthe half bridge is connected thereto also in the configuration shown inFIG. 9, the same problem of oscillation as the phenomenon explained inFIGS. 7 and 8 can occur when the switching element of one-side arm turnsON during dead time. In such an operational mode, there is thecorresponding operational mode also during a continuous operation. Thesame problem is easy to occur as high speed switching is performed.

It may occur not only in the three phase inverter circuit but also in aconverter using synchronous rectification.

In a half bridge circuit, a full bridge circuit, a three-phase bridgecircuit, etc., when a switching element of one-sided arm turns ON from adead time state when operating a converter or inverter, the phenomenonin which the gate erroneous turning-on (misfiring (erroneous firing))occurs resulting from the drain voltage change dV_(ds)/dt occurs easilywhen the switching element having the small ratio of C_(gs):C_(gd) (thecapacitance C_(gs) between the gate and the source: the capacitanceC_(gd) between the gate and the drain) is operated at high speedswitching.

Trigger for Oscillation and Energy Supply Source

FIG. 10A shows a circuit diagram for explaining a trigger foroscillation in the oscillation phenomenon, in the power circuitaccording to the first embodiment using the SiC MISFET. FIG. 10B shows acircuit diagram for explaining an energy supply source during theoscillation.

As shown in FIG. 10A, in the power circuit 1 according to the firstembodiment, a trigger for oscillation in the oscillation phenomenonoccurs when a threshold voltage of the first MISFET Q1 is exceeded by anincrement in the voltage (V_(gs),H) between the gate and the sourcesense resulting from rapid voltage change (dV_(ds),H)/dt between thedrain and the source in the first MISFET Q1 at the high sideaccompanying an on-operation of the second MISFET Q4 at the low side,and thereby an electric current which short-circuits between thepositive-side power terminal P and the negative-side power terminal Nflows.

Since there are the parasitic gate resistance and the parasiticinductance L_(G) although between the gate and the source in the firstMISFET Q1 at the high side is short-circuited, the voltage change(dV_(ds),H)/dt between the drain and the source is momentarily dividedand applied also between the gate and the source, if a voltage isapplied between the drain and the source in the first MISFET Q1. Morespecifically, the voltage (V_(gs),H) between the gate and the sourcesense is also increased as affected by the rapid voltage change(increment) between the drain and the source in the first MISFET Q1.

In the power circuit 1 according to the first embodiment, as shown inFIG. 10B, an energy supply source during the oscillation has occurred,when a part of energy stored as drain voltage serge at the time ofshort-circuit current convergence resulting from the resonance of thevoltage (V_(gs),H) between the gate and the source sense flows into thecapacitance C_(gs) between the gate and the source through ringing ofclosed loop LP1. More specifically, an injection current I_(i) flowsinto the capacitance C_(gs) between the gate and the source, and thenegative voltage is applied between the gate and the source in the firstMISFET Q1, and thereby it leads to re-erroneous turning-on due to thevoltage vibrating in closed loops LP1, LP2. The energy during theoscillation is supplied whenever the short circuit is converged. Anexample of the ringing waveform of the voltage (V_(ds),H) between thedrain and the source in the first MISFET Q1 is as shown in FIG. 8.

The characteristics of devices and modules which are easy to perform theerroneous turning-on are that the gate threshold voltage is low, thatthe parasitic gate resistance and the parasitic inductance of the shortcircuit closed loop LP2 between the gate and the source are large, andthat a ratio between the capacitance C_(gs) between the gate and thesource and the capacitance C_(gd) between the gate and the drain issmall.

On the other hand, the characteristics of devices and modules which areeasy to continue the oscillation are that the parasitic inductance ofthe short circuit closed loop LP2 between the gate and the source islarge, and that the parasitic inductance of the closed loop LP1 whichsupplies the short-circuit current at the time of the erroneousturning-on is large.

The SiC based MISFET essentially has a small ratio between thecapacitance C_(gs) between the gate and the source and the capacitanceC_(gd) between the gate and the drain. Particularly, the SiC TMISFETdoes not have junction type FET (JFET) in the current path, the voltagebetween the gate and the source sense for flowing the same drain currentbecomes lower since the on resistance R_(on), is low, and thereby asynthetic phenomenon between the erroneous turning-on and theoscillation energy supply appears easily and notably.

A suppression effect of the misoperation and the parasitic oscillationin the power circuit 1 according to the first embodiment isfundamentally assumed a point of after the erroneous turning-on of thedrain voltage change cause has occurred.

In the power circuit 1 according to the first embodiment, the gateddiode D_(G1) is connected between the first gate G1 and the first sourcesense SS1 of the first MISFET Q1. The gated diode D_(G1) is turned ONwhen the voltage is applied to the gate of the first MISFET Q1 in anegative direction, a low impedance current path is formed at the shortcircuit wiring between the gate G1 and the source sense SS1, and therebyit is made to discharge from the source sense SS1 towards the gate G1 inthe path which does not include the signal terminals GT1, SST1 etc.having a high parasitic inductance. Consequently, electric charging inthe negative direction to the capacitance C_(gs) between the gate andthe source and the vibration of the gate voltage are reduced, andthereby preventing from leading to the re-erroneous turning-on.

In the power circuit 1 according to the first embodiment, there is notime delay through IC when applying IC control since the gated diodeD_(G1) passively operates with respect to a movement of the gatevoltage. Accordingly, response is available also to the phenomenonoccurring for an extremely short time. Furthermore, since it is notnecessary to increase new control terminals, the function can beobtained without also impairing a merit of miniaturization of the wholemodule.

The above-mentioned countermeasure leads to efficiently use the merit ofthe SiC power modules in which the unipolar switching element ismounted, as a method for reducing the gate oscillation without impairingthe high speed switching performance.

Explanation of Effect in Simulation

FIG. 11A shows a circuit diagram for explaining an operation simulationwhen not connecting a gated diode as a control circuit thereto, in thepower circuit 1 according to the first embodiment.

As shown in FIG. 11A, in the half bridge configuration between the firstMISFET Q1 and the second MISFET Q4, a power supply voltage E, anelectrolytic capacitor C_(E), and a snubber capacitor C1 are connectedbetween the positive-side power terminal P and the negative-side powerterminal N. A parasitic inductance L_(E) is connected to the powersupply voltage E, a parasitic inductance L_(CE) is connected to theelectrolytic capacitor C_(E), and a parasitic inductance L_(C1) isconnected to the snubber capacitor C1. In the present embodiment, theload inductance L1 is connected between the drain and the source in thefirst MISFET Q1 at the high side, between the gate and the source in thefirst MISFET Q1 is short-circuited by a signal terminal portion, andthen the gate drive voltage is applied from the gate driver 50 tobetween the gate and the source in the second MISFET Q4 at the low sidein a state where the first MISFET Q1 is turned OFF.

In the present embodiment, the power supply voltage E is 100V, the loadinductance L1 is 500 μH, the gate drive voltage is 18V/0V, and theexternally connected gate resistance is 0Ω.

FIG. 11B shows a waveform example of voltages (V_(gs),H) (V_(gs),L)between the gate and the source sense, a waveform example of voltages(V_(ds),H), (V_(ds),L) between the drain and the source, and a waveformexample of the drain currents (I_(d),H), (I_(d),L), after applying thegate drive voltage, on the above-mentioned conditions. In FIG. 11B, thevoltages (V_(gs)H), (V_(gs),L) between the gate and the source sense are20V/div, voltages (V_(ds),H), (V_(ds),L) between the drain and thesource are 50V/div, and drain currents (I_(d),H), (I_(d),L) are 25A/div.

As shown in FIG. 11B, a phenomenon in which the gate in the first MISFETQ1 at the high side which should continue OFF repeats ON and OFF not beintended has occurred at the time when the second MISFET Q4 at the lowside is ON. Moreover, a voltage equal to or greater than twice of thepower supply voltage E=100V is applied to the voltage (V_(ds),H) betweenthe drain and the source in the first MISFET Q1 at the high side, and itwill easily lead to a device breakdown if the power supply voltage E ishigher.

Moreover, since I_(d), H denotes a drain current in the first MISFET Q1at the high side (direction from the source to the drain), and I_(d),Ldenotes a drain current in the second MISFET Q4 at the low side(direction from the drain to the source), the short-circuit currentbetween high-side and low-side arms between the first MISFET Q1 at thehigh side and the second MISFET Q4 at the low side is flowing, as shownin FIG. 11B.

FIG. 12 shows a circuit diagram for explaining an operation simulationwhen connecting the gated diode D_(G1) as a control circuit, in thepower circuit according to the first embodiment using the SiC TMISFET.In FIG. 12, the gated diode D_(G1) as a control circuit is connectedbetween the gate and the source in the first MISFET Q1 at the high side.Other configurations are the same as those shown in FIG. 11A.

FIG. 13A shows a waveform example of voltages (V_(gs),H), (V_(gs),L)between the gate and the source sense, a waveform example of voltages(V_(ds),H), (V_(ds),L) between the drain and the source, and a waveformexample of the drain currents (I_(d),H), (I_(d),L), after applying thegate drive voltage, in FIG. 12. In FIG. 13A, the voltages (V_(gs),H),(V_(gs),L) between the gate and the source sense are 20V/div, voltages(V_(ds),H), (V_(ds),L) between the drain and the source are 50V/div, anddrain currents (I_(d),H), (I_(d),L) are 25 A/div.

As shown in FIG. 13A, a phenomenon in which the gate in the first MISFETQ1 at the high side which should continue OFF repeats ON and OFF issuppressed at the time when the second MISFET Q4 at the low side is ON.Moreover, generation of the surge voltage in the voltage (V_(ds),H)between the drain and the source in the first MISFET Q1 at the high sideis also suppressed.

Moreover, the flowing of short-circuit current between high-side andlow-side arms between the first MISFET Q1 at the high side and thesecond MISFET Q4 at the low side is also suppressed as shown in FIG.13A.

FIG. 12B shows a waveform example (solid line) of a voltage (V_(gs),H)between the gate and the source sense when connecting the gated diodeD_(G1) as a control circuit thereto (FIG. 12), and a waveform example(dashed line) of a voltage (V_(gs),H) between the gate and the sourcesense when not connecting the gated diode D_(G1) thereto (FIG. 11A).

In the waveform example (dashed line) of the voltage (V_(gs),H) betweenthe gate and the source sense when not connecting the gated diode D_(G1)thereto (FIG. 11A), as shown in FIG. 12B, the phenomenon in which thegate in the first MISFET Q1 at the high side which should continue OFFrepeats ON and OFF not be intended has occurred at the time when thesecond MISFET Q4 at the low side is ON. However, the phenomenon in whichrepeats ON and OFF the gate in the first MISFET Q1 at the high sidewhich should continue OFF is suppressed, in the waveform example (solidline) of the voltage (V_(gs),H) between the gate and the source sensewhen connecting the gated diode D_(G1) thereto (FIG. 12). In particular,the waveform example (solid line) of the voltage (V_(gs),H) between thegate and the source sense is clamped approximately −0.5V. The valuereflects a value of the forward voltage of the gated diode D_(G1).

Furthermore, FIG. 13A shows a circuit diagram for explaining anoperation simulation when short-circuiting between the gate and thesource in the first MISFET Q1 at the high side by the transistor Q_(M1)for active mirror clamp, in the power circuit 1. FIG. 13B shows awaveform example of voltages (V_(gs),H), (V_(gs),L) between the gate andthe source sense, a waveform example of voltages (V_(ds),H), (V_(ds),L)between the drain and the source, and a waveform example of draincurrents (I_(d),H), (I_(d),L), in FIG. 13A. In FIG. 14B, the voltages(V_(gs),H), (V_(gs),L) between the gate and the source sense are20V/div, voltages (V_(ds),H), (V_(ds),L) between the drain and thesource are 50V/div, and drain currents (I_(d),H), (I_(d),L) are 25A/div. Also when between the gate and the source in the first MISFET Q1at the high side is short-circuited by the transistor Q_(M1) for activemirror clamp, the phenomenon which repeats ON and OFF in the gate of thefirst MISFET Q1 at the high side which should continue OFF issuppressed. Since between the gate and the source sense has alreadyshort-circuited with the low inductance in particular at the time ofsudden change of the voltage (V_(ds),H) between the drain and the sourcein the first MISFET Q1 at the high side accompanying the on-operation ofthe second MISFET Q2 at the low side, an increment of the voltage(V_(gs),H) between the gate and the source sense of in the first MISFETQ1 at the high side, and short circuit duration can be suppressed.Moreover, generation of a surge voltage in the voltage (V_(ds),H)between the drain and the source in the first MISFET Q1 at the highside, and a reverse direction voltage surge to the voltage between thegate and the source sense, and a short circuit between the arms in thefirst MISFET Q1 at the high side and the second MISFET Q4 at the lowside can also be suppressed. An example of applying the transistorQ_(M1) for active mirror clamp will be explained in detail in a powercircuit according to the second embodiment shown in FIG. 20.

As mentioned above, according to the first embodiment, there can beprovided the power circuit capable of reducing the erroneous turning-onand the induction from the erroneous turning-on to the parasiticoscillation at the time of operation of the power circuit composed ofthe MISFET, and further capable of realizing miniaturization and highspeed switching performance; and a power module in which such a powercircuit is mounted.

Power Module

FIG. 15 shows a schematic planar pattern configuration before forming aresin layer 120 in a module with the built-in half-bridge, in the powermodule 2 in which the power circuit 1 according to the first embodimentis mounted, and FIG. 16 shows a schematic bird's-eye view configurationafter forming a resin layer 120 thereon. The power module according tothe first embodiment 2 includes a configuration of a module with thebuilt-in half-bridge. More specifically, two MOSFETs Q1, Q4 are built inone module.

The circuit configuration of the power module 2 shown in FIG. 15corresponds to that of the power circuit 1 shown in FIG. 1. FIG. 15shows an example of 4-chip of the MISFETs Q1 and 4-chip of the MISFETsQ4 respectively disposed in parallel.

As shown in FIGS. 15 and 16, the power module according to the firstembodiment 2 includes: a positive-side power terminal P and anegative-side power terminal N disposed at a first side of the ceramicsubstrate 10 covered with the resin layer 120; a gate terminal GT1 and asource sense terminal SST1 disposed at a second side adjacent to thefirst side; an output terminal O disposed at a third side opposite tothe first side; and a gate terminal GT4 and a source sense terminal SST4disposed at a fourth side opposite to the second side. In the presentembodiment, the gate terminal GT1 and the source sense terminal SST1 areconnected to the signal wiring pattern GL1 for gate and the signalwiring pattern SL1 for source in the MISFET Q1; and the gate terminalGT4 and the source sense terminal SST4 are connected to the signalwiring pattern GL4 for gate and the signal wiring pattern SL4 for sourcein the MISFET Q4.

As shown in FIG. 15, wires GW1, GW4 for gate and wires SSW1, SSW4 forsource sense are connected towards the signal wiring patterns GL1, GL4for gate and the signal wiring patterns SL1, SL4 for source sense whichare disposed on the signal substrates 14 ₁, 14 ₄ from the MISFETs Q1,Q4. Moreover, gate terminals GT1, GT4 and SST1, SST4 for externalextraction are connected to the signal wiring patterns GL1, GL4 for gateand the signal wiring patterns SL1, SL4 for source sense by solderingetc.

As shown in FIG. 15, a gated diode D_(G1) is connected by soldering etc.so that the signal wiring patterns may be straddled, on the signalwiring pattern GL1 for gate, and the signal wiring pattern SL1 forsource sense. Similarly, a gated diode D_(G4) is connected by solderingetc. so that the signal wiring patterns may be straddled, on the signalwiring pattern GL4 for gate and the signal wiring pattern SL4 for sourcesense. Accordingly, when the gated diodes D_(G1), D_(G4) operate, anelectric current which flows towards the gates G1, G4 from the sourcesenses SS1, SS4 passes along a low inductance path only inside themodule which does not include the gate terminals GT1, GT4 and SST1, SST4for external extraction. As shown in FIGS. 1 and 15, the gated diodesD_(G1), D_(G4) effectively acts by being connected on the wiringincluding no main circuit wiring. The signal substrates 14 ₁, 14 ₄ areconnected by soldering etc. on the main substrate 10.

As shown in FIG. 15, the power module according to the first embodiment2 may include a snubber capacitor C_(B) electrically connected betweenthe positive-side power terminal P and the negative-side power terminalN.

Moreover, FIG. 17 shows a schematic bird's-eye view configuration afterforming the upper surface plate electrodes 22 ₁, 22 ₄ and before formingthe resin layer 120, in the power module according to the firstembodiment 2. The sources S1, S4 of 4 chips of the MISFETs Q1, Q4respectively disposed in parallel are commonly connected with the uppersurface plate electrodes 22 ₁, 22 ₄. Note that the wires GW1, GW4 forgate and the wires SSW1, SSW4 for source sense are not shown in FIG. 17.

In the power module according to the first embodiment 2, a variation inthe distance between the control circuit (gated diodes D_(G1), D_(G4))and the MISFETs Q1, Q4 can be reduced, and thereby the effect of theparasitic inductance can be controlled.

Although illustration is omitted in FIGS. 1 and 15-19, the diodes may beconnected reversely in parallel between D1 and S1 and between D4 and S4of the MISFETs Q1, Q4.

Although the sources S1, S4 of 4 chips of the MISFETs Q1, Q4 disposed inparallel are commonly connected with the upper surface plate electrodes22 ₁, 22 ₄ in an example shown in FIGS. 15-19, the sources may beconducted to one another with the wire instead of the upper surfaceplate electrodes 22 ₁, 22 ₄.

The positive-side power terminal P and the negative-side power terminalN, and the gate terminals GT1, GT4 and SST1, SST4 for externalextraction can be formed of Cu, for example.

The main substrate 10 and the signal substrates 14 ₁, 14 ₄ can be formedof a ceramic substrate. For example, the ceramic substrate 10 may beformed of Al₂O₃, AlN, SiN, AlSiC, or SiC of which at least the surfaceis insulation.

The main wiring conductors (electrode patterns) 12, 12 ₀, 12 ₁, 12 ₄, 12_(n) can be formed of Cu, Al, etc., for example.

The electrode pillars 20 ₁, 20 ₄ and the upper surface plate electrodes22 ₁, 22 ₄ portion for connecting the sources S1, S4 of the MISFETs Q1,Q4 and the upper surface plate electrodes 22 ₁, 22 ₄ may be formed ofCuMo, Cu, etc., for example. If materials of the same size of which thevalues of Coefficient of Thermal Expansion (CTE) are equivalent to eachother are compared, the generated stress of materials having a largervalue of Young's modulus becomes larger than that of materials having asmaller value of Young's modulus. Accordingly, if materials of which thevalue of Young's modulus×CTE is smaller is selected, structural membershaving a smaller value of the generated stress can be obtained. CuMo hassuch an advantage. Moreover, although CuMo is inferior to Cu, theelectric resistivity of CuMo is also relatively low. Moreover, aseparation distance along the surface between the upper surface plateelectrodes 22 ₁, 22 ₄ is called a creepage distance. A value of thecreepage distance thereof is approximately 2 mm, for example.

The wires GW1, GW4 for gate and the wires SSW1, SSW4 for source sensecan be formed of Al, AlCu, etc., for example.

SiC based power devices, e.g. SiC DIMISFET and SiC TMISFET, or GaN basedpower devices, e.g. GaN based High Electron Mobility Transistor (HEMT),are applicable as the MISFETs Q1, Q4. In some instances, power devices,e.g. Si based MISFETs and IGBT, are also applicable thereto.

As the gated diodes D_(G1), D_(G4), an Si based SBD or a Zener diode, orSBD or a Zener diode using, e.g. an SiC based or a GaN based wide gapsemiconductors, are applicable.

Moreover, a ceramic capacitor etc. are applicable, as the snubbercapacitor connected between the positive-side power terminal P and thenegative-side power terminal N.

Moreover, transfermold resins, thermosetting resins, etc. applicable tothe SiC based semiconductor device can be used as the resin layer 120.Moreover, silicone based resins, e.g. silicone gel, may partially beapplied thereto, or case type power modules may be adopted to be appliedto the whole thereof.

Modified Example

In the power module 2 according to a modified example of the firstembodiment, FIG. 18 shows a schematic planar pattern configurationbefore forming the resin layer 120, and FIG. 19 shows a schematicbird's-eye view configuration after forming the resin layer 120 thereon.In the power module 2 according to the modified example of the firstembodiment, bonding wires. BW_(S1), BW_(S4) are used therefor instead ofthe upper surface plate electrodes 22 ₁, 22 ₄. More specifically, asshown in FIG. 18, between the source pad electrode SP1 of the MISFET Q1and the electrode pattern 12 ₄ is connected via the bonding wireBW_(S1), and the source pad electrode SP4 of the MISFET Q4 and theelectrode pattern 12 _(n) (EP) are connected to each other via thebonding wire BW_(S1). The bonding wires BW_(S1), BW_(S4) can be formedof Al, AlCu, etc., for example.

The distance between the signal substrates 14 ₁, 14 ₄ and the MISFETsQ1, Q4 is separated for approximately 2 mm, for example. This is becauseof forming the bonding wires BW_(S1), BW_(S4) shorter.

Moreover, as shown in FIG. 18, the power module 2 according to themodified example of the first embodiment may include snubber capacitorsC_(B), C_(B) connected between the positive-side power terminal P andthe negative-side power terminal N. Since other configurations are thesame as that of the first embodiment, the duplicated explanation of eachpart is omitted.

Second Embodiment Power Circuit and Power Module

FIG. 20 shows a schematic circuit configuration of a half bridgecircuit, in a power circuit 1 according to a second embodiment. Notethat the power circuit 1 according to the second embodiment is notlimited to such a half bridge circuit, but can be applied also to a fullbridge circuit or a three-phase bridge circuit.

Moreover, FIG. 15 also shows a schematic planar pattern configurationbefore forming a resin layer 120 in a module with the built-inhalf-bridge, in the power module 2 in which the power circuit 1according to the second embodiment is mounted.

Moreover, the same configuration as a configuration example of the powermodule 2 according to the first embodiment and its modified example(FIGS. 15-19) is applicable to the power module 2 according to thesecond embodiment.

In the power circuit 1 according to the second embodiment and the powermodule 2 in which such a power circuit 1 is mounted, as shown in FIG.20, transistors Q_(M1), Q_(M4) for active mirror clamp are appliedinstead of the gated diodes D_(G1), D_(G4) as in the first embodiment.

Moreover, FIG. 21A shows an operation circuit explanatory diagram of anactive mirror clamp applied as a control circuit, in the power circuit 1according to the second embodiment, and FIG. 21B shows an operationwaveform explanatory diagram shown in FIG. 21A.

As shown in FIG. 21A, the transistors Q_(M1) for active mirror clamp areconnected in parallel between the gate and the source in the firstMISFET Q1, and provides a dead time of OFF state mutually with the firstMISFET Q1 to fundamentally execute complementary operation. Morespecifically, as shown in FIG. 21B, if the voltage V_(gs)′ between thegate and the source of the transistor Q_(M1) for active mirror clamp ishigh-level, the voltage V_(gs), between the gate and the source of thefirst MISFET Q1 equal to the voltage between the drain and the source ofthe transistor Q_(M1) for active mirror clamp is a low level, and if agate driving signal is input in a state where the voltage V_(gs)′between the gate and the source of the transistor Q_(M1) for activemirror clamp is in a low level, the voltage V_(gs) between the gate andthe source of the first MISFET Q1 equal to the voltage between the drainand the source of the transistor Q_(M1) for active mirror clamp becomeshigh-level.

In FIG. 21A, the gate resistance R_(g1), R_(g2), a pnp type bipolarjunction transistor Q_(p), npn type bipolar junction transistor Q_(n),and the capacitor C_(i) schematically express a gate driver circuit ofthe first MISFET Q1. ON and OFF driving of the first MISFET Q1 can beperformed by inputting a signal into the gate terminals G_(p) of the pnptype bipolar junction transistor Q_(p) and npn type bipolar junctiontransistor Q_(n) of the inverter configuration. In addition, aComplementary Metal Oxide Semiconductor (CMOS) FET may be appliedinstead of the pnp type bipolar junction transistor Q_(p) and the npntype bipolar junction transistor Q_(n).

In the power circuit 1 according to the second embodiment and the powermodule 2 in which such a power circuit 1 is mounted, the active mirrorclamp circuit (transistors Q_(M1), Q_(M4) for active mirror clamp) forcomplementarily operating to the voltages V_(gs), V_(gs) between thegate and the source sense of the first MISFET Q1 and the second MISFETQ4 is provided in the module, and corresponding transistors Q_(M1) . . .Q_(M4) for active mirror clamp are operated during the respective gateOFF periods of the first MISFET Q1 and the second MISFET Q4, and therebythe same effect as that of the gated diodes D_(G1), D_(G4) in the firstembodiment can be obtained when the negative-direction voltage isapplied to the capacitance between gate and source.

Although gate signal wiring patterns of the transistors Q_(M1) . . .Q_(M4) for active mirror clamp and the gate terminals MGT1, MGT4 formirror clamp are newly required, an erroneous turning-on caused by drainvoltage change can also be suppressed since the diode response time canbe skipped and a low impedance effect of short circuit wiring can beobtained, with compared with the gated diodes D_(G1), D_(G4).

Moreover, an effect of instantaneous heat generation from thesemiconductor chip can be avoided by disposing the transistors foractive mirror clamp Q_(M1) . . . Q_(M4) on the signal substrates 14 ₁,14 ₄.

In the power circuit 1, an operation simulation when short-circuitingbetween the gate and the source in the first MISFET Q1 at the high sideby the transistor Q_(M1) for active mirror clamps is as explained inFIGS. 14A and 14B. Also when between the gate and the source in thefirst MISFET Q1 at the high side is short-circuited by the transistorQ_(M1) for active mirror clamps, the phenomenon which repeats ON and OFFin the gate of the first MISFET Q1 at the high side which shouldcontinue OFF is suppressed. Since between the gate and the source sensehas already short-circuited with the low parasitic inductance inparticular at the time of sudden change of the voltage (V_(ds),H)between the drain and the source in the first MISFET Q1 at the high sideaccompanying the on-operation of the second MISFET Q2 at the low side,an increment of the voltage (V_(gs),H) between the gate and the sourcesense of in the first MISFET Q1 at the high side, and short circuitduration can be suppressed. Moreover, generation of a surge voltage inthe voltage (V_(ds),H) between the drain and the source in the firstMISFET Q1 at the high side, and a short circuit between the arms in thefirst MISFET Q1 at the high side and the second MISFET Q4 at the lowside can also be suppressed.

As shown in FIGS. 20 and 15, the power circuit 1 according to the secondembodiment is a circuit in which a plurality of MISFET is included, anddrains D1, D4 of the first MISFET Q1 and the second MISFET Q4 areelectrically connected on the main substrate 10 including electrodepatterns 12 ₁, 12 _(n), 12 ₄. The power circuit 1 according to thesecond embodiment simultaneously includes gates G1, G4, source sensesSS1, SS4, a gate terminal GT1 for external extraction, a source senseterminal SST1, and power terminals P, N; and includes a first controlcircuit for controlling at least a current path conducted from the firstsource S1 towards the first gate G1 of the first MISFET Q1.

Furthermore, particularly as shown in FIGS. 20 and 15, the power circuit1 according to the second embodiment includes: a main substrate 10; afirst electrode pattern 12 ₁ disposed on the main substrate 10 andconnected to a positive-side power terminal P; a second electrodepattern 12 _(n) disposed on the main substrate 10 and connected to anegative-side power terminal N; a third electrode pattern 12 ₄ disposedon the main substrate 10 and connected to an output terminal O; a firstMISFET Q1 in which a first drain D1 is disposed on the first electrodepattern 12 ₁; a second MISFET Q4 in which a second drain D4 is disposedon the third electrode pattern 12 ₄; and a first control circuitconnected between the first gate G1 and the first source S1 of the firstMISFET Q1, the first control circuit configured to control a currentpath conducted from the first source S1 towards the first gate G1.

The power circuit 1 according to the second embodiment further mayinclude a second control circuit connected between the second gate G4and the second source S4 of the second MISFET Q4, the second controlcircuit configured to control a current path conducted from the secondsource S4 towards the second gate G4.

In the present embodiment, the first control circuit includes a thirdMISFET Q_(M1) for mirror clamp in which a third drain is connected to afirst gate and a third source is connected to a first source.

Moreover, the second control circuit includes a fourth MISFET Q_(M4) formirror clamp in which a fourth drain is connected to a second gate and afourth source is connected to a second source.

Moreover, as shown in FIGS. 20 and 15, in the power circuit 1 accordingto the second embodiment, a part of the electrode patterns 12 ₁, 12_(n), 12 ₄ may be disposed on signal substrates 14 ₁, 14 ₄ differentfrom the main substrate 10, the signal substrates 14 ₁, 14 ₄ may bedisposed on the main substrate 10, and the control circuit may bedisposed on the signal substrates 14 ₁, 14 ₄. By adopting such aconfiguration, the control circuit becomes difficult to receive aneffect of instantaneous heat generation of the transistor, and therebycan avoid a misoperation.

In particularly, in the same manner as FIG. 15, the power circuit 1according to the second embodiment may include a first signal substrate14 ₁ disposed on a main substrate 10, the first signal substrate 14 ₁ inwhich: a signal wiring pattern GL1 for first gate connected to the firstgate G1; a signal wiring pattern SL1 for first source sense connected tothe first source S1; and a signal wiring pattern MGL1 (not shown) forgate for active mirror clamps connected to the gate MG1 for activemirror clamp are mounted.

In the same manner as FIG. 15, the power circuit 1 according to thesecond embodiment may include a second signal substrate 14 ₄ disposed onthe main substrate 10, the second signal substrate 14 ₄ in which: asignal wiring pattern GL4 for second gate connected to the second gateG4; and a signal wiring pattern SL4 for second source sense connected tothe second source S4; and a signal wiring pattern MGL4 (not shown) forgate for active mirror clamp connected to the gate MG4 for active mirrorclamp are mounted.

In the present embodiment, the first control circuit may include a thirdMISFET Q_(M1) for active mirror clamp connected between the signalwiring pattern for first gate and the signal wiring pattern for firstsource sense.

Moreover, the second control circuit may include a fourth MISFET Q_(M4)4 for active mirror clamp connected between the signal wiring patternfor second gate and the signal wiring pattern for second source sense.

In the case of the active mirror clamp circuit, it can be compactlyformed by forming the gates MG1, MG4 of the MISFETs Q_(M1), Q_(M4) foractive mirror clamp on the signal substrates 14 ₁, 14 ₄. In this case,it is preferable to be configured so that three wirings (i.e., signalwiring patterns GL1, GL4 for gate of the MISFETs Q₁, Q₄, signal wiringpatterns SL1, SL4 for source sense, signal wiring patterns MGL1, MGL4for active mirror clamp gate of the MISFETs Q_(M1), Q_(M4)) are disposedin parallel on the planar main substrate 10, and the signal wiringpatterns MGL1, MGL4 for active mirror clamp gate of the MISFETs Q_(M1),Q_(M4) are inserted between other wirings.

In the power circuit 1 according to the second embodiment and the powermodule 2 in which such a power circuit 1 is mounted, the third MISFETQ_(M1) for active mirror clamp for reducing a vibration of the voltagebetween the gate and the source is connected to the gate G1 and sourcesense SS1 wiring patterns in which the first MISFET is mounted thereon(the source is at the source sense SS1 side and the drain is at the gateG1 side) (it is important to be disposed inside from the signalterminals GT1, SST1 connected to outside). By connecting the thirdMISFET Q_(M1) in this way, even when the erroneous turning-on occurs,the electric current which flow into in a negative direction to thecapacitance between gate and source and vibration of the voltage betweenthe gate and the source can be suppressed, and thereby stable operationcan be obtained. Moreover, the power circuit 1 can be miniaturized sinceit can be composed with a simple circuit. Since it can be alwaysoperated unlike the diodes, it can be immediately operated, and thevoltage between the gate and the source change and the erroneousturning-on which are caused by changing of the voltage between the drainand the source can also be suppressed.

As shown in FIG. 20, there are parasitic inductances L_(GP1), L_(SP1)associated with routing of signal terminals GT1, SST1 and electrodewiring, etc. between the signal terminals GT1, SST1 for externalextraction and the gate G1, the source sense SS1 in the first MISFET Q1.Since such an inductance component exists in a gate closed circuit ofthe first MISFET Q1, it causes an operation delay in a gate driving ofthe first MISFET Q1.

Although the third MISFET Q_(M1) is disposed between the gate G1 wiringand the source sense SS1 wiring, the effect becomes higher as thedistance from the drain and the source in the third MISFET Q_(M1) to thegate pad electrode GP and the source sense pad electrode SSP in thefirst MISFET Q1 becomes shorter in order to reduce the parasitic effectdue to such an inductance component. In the present embodiment, the gatepad electrode GP and the source sense pad electrode SSP in the firstMISFET Q1 are formed on a front side surface of the first MISFET Q1.Accordingly, even if the third MISFET Q_(M1) is built in the same chipas the first MISFET Q1, the source of the third MISFET Q_(M1) can alsodirectly be soldered on the source pad electrode SP of the first MISFETQ1.

Moreover, although the third MISFET Q_(M1) may be disposed collectivelyfor every first MISFET Q1 disposed in parallel, it is more effective toindividually connect the third MISFET QM1 to every first MISFET Q1,respectively.

Although, it is important for the third MISFET Q_(M1) to be disposedinside from the signal terminals GT1, SST1 for external extractionhaving parasitic inductances L_(GP1), L_(SP1) and therefore it is moreeffective as nearest to the first MISFET Q1.

However, since temperature becomes higher when connecting the thirdMISFET Q_(M1) directly on the chip of the first MISFET Q1, it ispreferable to compose the third MISFET Q_(M1) from wideband gapsemiconductors, e.g. SiC, GaN, etc. with satisfactory high-temperaturecharacteristics. The above-mentioned explanation is the same also asthat of the fourth MISFET Q_(M4) for mirror clamp.

As explained above, according to the power circuit 1 according to thesecond embodiment, there can be obtained the small-sized half bridgecircuit for reducing the oscillation. Note that it is not limited tosuch a half bridge circuit, but a full bridge circuit or a three-phasebridge circuit can also similarly be applied thereto.

Moreover, any one the first MISFET Q1 or the second MISFET Q2 can becomposed of the SiC MISFET. SiC can realize low on resistance R_(on) byrealizing high concentration of a drift layer since the dielectricbreakdown electric field is higher. However, since an expansion width ofdepletion layer with respect to the drift layer is limited for theamount thereof and a feedback capacitance C_(rss) is not easily reduced,the C_(gs):C_(gd) ratio is not excellent, and a gate erroneousturning-on operation caused by the drain voltage change dV_(ds)/dteasily occurs, but the misoperation and the parasitic oscillation can bereduced and high speed switching performance can be secured by applyingthe power circuit 1 according to the second embodiment thereto.

According to the power module 2 including the power circuit 1 accordingto the second embodiment therein, there can be composed a module intowhich the control circuit is also incorporated. Accordingly, a variationin the distance between the control circuit and the MISFET can bereduced, and therefore the effect of the parasitic inductance can becontrolled.

Modified Example

FIG. 22 shows a schematic circuit configuration of a half bridgecircuit, in a power circuit 1 according to a modified example of thesecond embodiment.

FIG. 23 shows an operation circuit explanatory diagram of the activemirror clamp applied thereto as a control circuit, in the power circuit1 according to the modified example of the second embodiment.

In FIG. 22, an inside of the power module includes a first gatecapacitor C_(G1) and a second gate capacitor C_(G4) for applyinggate-negative bias respectively connected between the sources M_(S1),M_(S4) in the third and fourth MISFETs Q_(M1), Q_(M4) for active mirrorclamp, and the source senses SS1, SS4 in the first and second MISFETsQ1, Q4. Moreover, the power module includes a source terminal MST1 forfirst active mirror clamp and a source terminal MST4 for second activemirror clamp electrically connected to sources MS1, MS4 in the third andfourth MISFETs Q_(M1), Q_(M4) for active mirror clamp, respectively.

Moreover, as shown in FIG. 23, a gate-negative bias (−V_(g)) input and acollector side of the pnp transistor Q_(p) are connected to the signalterminal MST1 for active mirror clamp, and thereby the parasiticinductance of the closed loop LP3 between the gate and the source sensein the MISFET Q1 including the gate capacitor C_(G) can be reduced.Accordingly, although one piece of the signal terminal is furtherrequired, it becomes possible to utilize the active mirror clamp circuitwith a low parasitic inductance, while the gate voltage is applied tothe negative bias (−V_(g)) side when the MISFET Q1 is in OFF state, andthereby it is possible to suppress more effectively the erroneousturning-on operation and the oscillation caused by a rapid change of thevoltage between the drain and the source.

As mentioned above, according to the second embodiment, there can beprovided the power circuit capable of reducing the erroneous turning-onand the induction from the erroneous turning-onto the parasiticoscillation at the time of operation of the power circuit composed ofthe MISFET, and further capable of realizing miniaturization and highspeed switching performance; and a power module in which such a powercircuit is mounted.

Third Embodiment Power Circuit and Power Module

FIG. 24 shows a schematic circuit configuration of a half bridgecircuit, in a power circuit 1 according to a third embodiment.

FIG. 25 shows a top view diagram before forming a resin layer, in apower module 2 in which a power circuit 1 according to the thirdembodiment is mounted.

The power circuit 1 according to the third embodiment includes a snubbercapacitor C_(PN) connected between the positive-side power terminal Pand the negative-side power terminal N in order to reduce a drainvoltage serge by suppressing a parasitic inductance in a short-circuitcurrent path. Although illustration is omitted, other configurations arethe same as those of the power circuits 1 according to the first andsecond embodiments including the control circuit.

Since the parasitic inductance of the short-circuit current path isreduced by the snubber capacitor C_(PN), not only the drain voltageserge is reduced, but also short circuit duration when the erroneousturning-on occurs is reduced, and thereby a supply energy for continuingthe oscillation can be reduced. More specifically, the oscillation canbe reduced by building therein the snubber capacitor C_(PN) connectedbetween the positive-side power terminal P and the negative-side powerterminal N, in the power circuit 1 according to the third embodiment. Inaddition, the method of building therein the snubber capacitor C_(PN)connected between the positive-side power terminal P and thenegative-side power terminal N can be similarly applied to the powercircuits 1 according to the first and second embodiments, and therebythe oscillation can be similarly reduced.

Such a snubber capacitor C_(PN) built in the power module 2 has arestriction on a size thereof in accordance with a size of the module,and if the capacitance value is small, the voltage between thepositive-side power terminal P and the negative-side power terminals Nand a drain current will be vibrated by ringing, a voltage drop at thetime of short circuit occurring, and electric charging to the snubbercapacitor C_(PN) from the power supply, and it will lead to breakdown orwill become a noise source. Accordingly, an appropriate design forsuitable capacitance values and an appropriate selection of the targetpower supply circuits are required therefor. The oscillation can be moreeffectively suppressed by combining the aforementioned method and thepower circuits according to the first to third embodiments. Since theparasitic inductance of the short circuit path between the gate and thesource sense have an effect on the short circuit duration when theerroneous turning-on occurs, the parasitic inductance of the shortcircuit path between the gate and the source may also be simultaneouslyadjusted.

In particular, in the power module 2 in which the power circuit 1according to the third embodiment is mounted, a layout in the module isdevised so as to remove the positive-side power terminal P and thenegative-side power terminal N from the short circuit path, in order tofurther reduce the parasitic inductance related to the short circuit orringing. More specifically, as shown in FIG. 25, the power module 2 mayinclude: an extended electrode 25 ₄ for extending an upper surface plateelectrode 22 ₄ in a direction along the positive-side power terminal P;and a pillar connection electrode 18 ₁ disposed on the electrode pattern12 ₁, so that a plurality of snubber capacitors C_(PN1), C_(PN2),C_(PN3) may be connected in parallel between the extended electrode 25 ₄and the pillar connection electrode 18 ₁. In addition, the pillarconnection electrode 18 ₁ can be formed of metallic poles, e.g. Cu,etc., and/or may be formed as an extended portion of the positive-sidepower terminal P. Moreover, ceramic capacitors etc. are applicable asthe snubber capacitors C_(PN1), C_(PN2), C_(PN3).

As shown in FIG. 25, in the power module according to the thirdembodiment 2, the parasitic inductance related to the short circuit orringing can be reduced by directly connecting the plurality of thesnubber capacitors C_(PN1), C_(PN2), C_(PN3) in parallel so as tostraddle between the extended electrode 25 ₄ and the pillar connectionelectrode 18 ₁. Moreover, space of the disposition in which theplurality of the snubber capacitors C_(PN1), C_(PN2), C_(PN3) areconnected thereto in parallel can be obtained by forming a top face ofthe upper surface plate so as to be lower than the top faces of thepositive-side power terminal P and the negative-side power terminal N.

Modified Example 1

FIG. 26 is a top view diagram before forming a resin layer in the modulewith the built-in half-bridge, in the power module 2 according to amodified example 1 of the third embodiment.

FIG. 27 shows a schematic circuit configuration of the half bridgecircuit corresponding to that in FIG. 26, in a power circuit 1 accordingto the modified example 1 of the third embodiment.

The power circuit 1 according to the modified example of the thirdembodiment includes a snubber capacitors C_(PN1), C_(PN2), C_(PN3)connected in series between the positive-side power terminal P and thenegative-side power terminal N in order to reduce a drain voltage sergeby suppressing a parasitic inductance in a short-circuit current path.Other configurations are the same as those of the power circuit 1according to the third embodiment.

In addition, FIGS. 26 and 27 show schematically power terminalinductances LP1, LS1 as a parasitic inductance accompanying thepositive-side power terminal P and the negative-side power terminal N.Also the power circuit 1 according to the modified example 1 of thethird embodiment can be execute operation in which the power terminalinductances LP1, LS1 as the parasitic inductance accompanying thepositive-side power terminal P and the negative-side power terminal Nare removed.

The supply energy for continuing the oscillation can be reduced byproviding the snubber capacitors C_(PN1), C_(PN2), C_(PN3) therewith.More specifically, the oscillation can be reduced by building thereinthe snubber capacitors C_(PN1), C_(PN2), C_(PN3) connected in seriesbetween the positive-side power terminal P and the negative-side powerterminal N, in the power circuit 1 according to the modified example 1of the third embodiment.

In particular, in the power module 2 in which the power circuit 1according to the modified example 1 of the third embodiment is mounted,a layout in the module is devised so as to remove the positive-sidepower terminal P and the negative-side power terminal N from the shortcircuit path in order to further reduce the parasitic inductance relatedto the short circuit or ringing. More specifically, as shown in FIG. 26,the power module 2 includes adjacent patterns TP1, TP4 disposed so as tobe adjacent to the electrode patterns 12 ₁, 12 ₄, 12 _(n) so that thesnubber capacitor C_(PN1) is connected between the electrode pattern 12₁ and the adjacent pattern TP1, the snubber capacitor C_(PN2) isconnected between the adjacent patterns TP1, TP4, and the snubbercapacitor C_(PN3) is connected between the adjacent pattern TP4 and theelectrode pattern 12 _(n). Moreover, ceramic capacitors etc. areapplicable as the snubber capacitors C_(PN1), C_(PN2), C_(PN3).

In the power module 2 according to the modified example 1 of the thirdembodiment, the parasitic inductance concerned can be reduced bydisposing the snubber capacitors C_(PN1), C_(PN2), C_(PN3), connected inseries between the positive-side power terminal P and the negative-sidepower terminal N, so as to straddle between the patterns. The breakdownvoltage of the snubber capacitors C_(PN1), C_(PN2), C_(PN3) connectedthereto in series can be improved by connecting the snubber capacitorsin series. In this case, a numerical example of the snubber capacitorsC_(PN1), C_(PN2), C_(PN3) is approximately 10 nF/breakdown voltage of600V per one capacitor, for example, and a desired function can beobtained while securing the breakdown voltage by connecting a pluralityof the snubber capacitors in series thereto. Each snubber capacitor andits installation pattern in this case are disposed in parallel to a partof closed loop circuit formed of the half bridge and the snubbercapacitor. Thereby, the effect is improved by reducing the parasiticinductance in the closed loop. Moreover, even if a plurality of thesnubber capacitors C_(PN1), C_(PN2), C_(PN3) are formed by beingrespectively connected thereto in parallel, a resistance for keeping abalance of the voltages applied to the respective capacitances may beinserted therein, and it may be designed so that the resonant frequencyof the closed loop may be adjusted with the capacitance value.

Modified Example 2

FIG. 28 is a top view diagram before forming a resin layer in the modulewith the built-in half-bridge, in the power module 2 according to amodified example 2 of the third embodiment.

Moreover, FIG. 29 shows a schematic circuit configuration of the halfbridge circuit corresponding to that in FIG. 28, in a power circuit 1according to the modified example 2 of the third embodiment.

The power circuit 1 according to the modified example 2 of the thirdembodiment includes RCD snubber circuits (R_(S1), C_(S1), D_(S1) andR_(S4), C_(S4), D_(S4)) between the positive-side power terminal P andthe negative-side power terminal N in order to reduce the drain voltageserge by suppressing the parasitic inductance of the short-circuitcurrent path. Other configurations are the same as those of the powercircuit 1 according to the third embodiment.

The supply energy for continuing the oscillation can be reduced by theRCD snubber circuits (R_(S1), C_(S1), D_(S1) and R_(S4), C_(S4),D_(S4)). More specifically, also in the power circuit 1 according to themodified example 2 of the third embodiment, the oscillation can besuppressed by building therein the RCD snubber circuits (R_(S1), C_(S1),D_(S1) and R_(S4), C_(S4), D_(S4)) between the positive-side powerterminal P and the negative-side power terminal N.

In particular, in the power module 2 in which the power circuit 1according to the modified example 2 of the third embodiment is mounted,a layout in the module is devised so as to remove the positive-sidepower terminal P and the negative-side power terminal N from the shortcircuit path in order to further reduce the parasitic inductance relatedto the short circuit or ringing. More specifically, as shown in FIG. 28,the power module 2 includes resistance patterns R_(S1), R_(S4) disposedso as to be adjacent to the electrode patterns 12 ₁, 12 ₄, 12 _(n), thesnubber capacitor C_(S1) is connected between the electrode pattern 12 ₁and the resistance pattern R_(S1), the snubber capacitor C_(S4) isconnected between the electrode pattern 12 ₄ and the resistance patternR_(S4), the snubber diode D_(S1) is connected between the resistancepattern R_(S1) and the electrode pattern 12 ₄, and the snubber diodeD_(S4) is connected between the resistance pattern R_(S4) and theelectrode pattern 12 _(n). Moreover, between the electrode pattern 12_(n) and the resistance pattern R_(S1) is connected with a bonding wireB_(WR1), and between the resistance pattern R_(S4) and the electrodepattern 12 ₁ is connected with a bonding wire B_(WR4). As the snubbercapacitors C_(S1), C_(S4), ceramic capacitors etc. are applicable. An Sibased SBD, or SBD using wide gap semiconductors, e.g. a GaN based SBD,an SiC based SBD, etc. are applicable, as the snubber diodes D_(S1),D_(S4).

In the power module 2 according to the modified example 2 of the thirdembodiment, the parasitic inductance concerned can be reduced byconnecting the RCD snubber circuit (R_(S1), C_(S1), D_(S1) and R_(S4),C_(S4), D_(S4)) between the positive-side power terminal P and thenegative-side power terminal N so as to straddle between the patterns orso as to connect each element with wire connection.

Substrate Structure

FIG. 30 shows a schematic cross-sectional structure of the mainsubstrate (ceramic substrate) 10 and the signal substrate 14 disposed onthe ceramic substrate 10, in a substrate structure applied to the powermodule 2 according to the first to third embodiments. The signalsubstrate 14 can also be formed of ceramic substrates. A solder layerfor connecting between the ceramic substrate 10 and the signal substrate14 is omitted in FIG. 30.

A copper plate layer 10 a and a copperplate layer 10 b are respectivelyformed on a front side surface and a back side surface of the ceramicsubstrate 10. A copper plate layer 14 a and a copper plate layer 14 bare respectively formed also on a front side surface and a back sidesurface of the signal substrate 14. In the present embodiment, thethickness of the signal substrate 14 is approximately 0.8 mm, forexample, and the thicknesses of the copper plate layer 14 a and thecopper plate layer 14 b are approximately 0.4 mm, for example, and thesethicknesses thereof may be designed so as to be a value by which theeffect of the radiation noise can be reduced by spatially separating thecontrol circuit from the MISFET. The copper plate layer 10 b has afunction as a heat spreader.

The power module 2 according to the first to third embodiments mayinclude a shield for shielding the radiation noise between the inside offirst signal substrate 14 ₁ or the main substrate 10, and the firstsignal substrate 14 ₁. Similarly, the power module 2 may include ashield for shielding the radiation noise between the inside of secondsignal substrate 14 ₄ or the main substrate 10, and the second signalsubstrate 14 ₄.

FIG. 31 shows a schematic cross-sectional structure of the mainsubstrate (ceramic substrate) 10 and the signal substrate 14 disposed onthe ceramic substrate 10 and having a shield layer 14BR therein, in asubstrate structure applied to the power module 2 according to the firstto third embodiments. A solder layer for connecting between the ceramicsubstrate 10 and the signal substrate 14 is omitted in FIG. 31.

FIG. 32 shows a schematic cross-sectional structure of the ceramicsubstrate 10 and the signal substrate 14 disposed on the ceramicsubstrate 10 via a shield metallic plate 15 and having a shield layer14BR therein, in a substrate structure applied to the power module 2according to the first to third embodiments. A solder layer forconnecting between the ceramic substrate 10 and the signal substrate 14is omitted in FIG. 32.

In the power module according to the first embodiment 2, not only theeffect of the instantaneous heat generation in the semiconductor chipcan be avoided by disposing the gated diodes D_(G1), D_(G4) on thesignal substrates 14 ₁, 14 ₄, but also the misoperation of the controlcircuit due to the effect of the radiation noise can be prevented byproviding the shield layer 14BR in the inside of the signal substrates14 ₁, 14 ₄. Moreover, the same effect can be obtained even by providingthe shield metallic plate 15 for shielding the radiation noise betweenthe main substrate 10 and the second signal substrate 14 ₄.

Similarly, in the power module 2 according to the second embodiment, notonly the effect of the instantaneous heat generation from thesemiconductor chip can be avoided by disposing the transistor Q_(M1),Q_(M4) for active mirror clamp on the signal substrates 14 ₁, 14 ₄, butalso the misoperation of the active mirror clamp gate control circuitcan be prevented due to the effect of the radiation noise by providingthe shield layer 14BR in the inside of the signal substrates 14 ₁, 14 ₄.Moreover, the same effect can be obtained even by providing the shieldmetallic plate 15 for shielding the radiation noise between the mainsubstrate 10 and the second signal substrate 14 ₄. With respect to theradiation noise tolerance of the signal wiring patterns GL1, GL4 forgate and the signal wiring patterns SL1, SL4 for source sense, an effectequal to or greater than the effect that both are at a distance fromeach other can be obtained.

Fourth Embodiment

FIG. 33A shows an example of a circuit configuration composed of adiscrete device, in a power circuit according to a fourth embodiment,and FIG. 33B shows an example of a plane configuration of a power module3 corresponding to FIG. 33A.

In the power module 3 according to the fourth embodiment, as shown inFIG. 33B, an MISFET Q1 to which a drain is connected on a metal die 140is contained in a package 150. The gated diode D_(G1) is disposed in thepackage 150 so that the anode thereof is connected on the source senseterminal SST1. The source pad electrode SP and the gate pad electrode GPof the MISFET Q1 are disposed at a front surface side, as shown in FIG.33B.

In the power module 3 according to the fourth embodiment, the gate G1 ofthe MISFET Q1 corresponds to the gate pad electrode GP, and the sourcesense SS1 of the MISFET Q1 corresponds to the source pad electrode SPcommonly connected to the source S.

Furthermore, in the package 150, between the source pad electrode SP andthe source sense terminal SST1 is connected via a bonding wire BW_(S1),between the gate pad electrode GP and the gate terminal GT1 is connectedvia a bonding wire BW_(G1), and between the cathode K and gate terminalGT1 of the gated diode D_(G1) disposed on the source sense terminal SST1is connected via a bonding wire BW_(GS). The metal die 140 to which thedrain of the MISFET Q1 is connected extends in that condition to formthe diode terminal DT.

Also in the power module 3 according to the fourth embodiment, theparasitic inductance concerned in the gate terminal GT1 and the sourcesense terminal SST1 can be reduced by disposing the gated diode D_(G1)so as to be adjacent to the MISFET Q1 in the package 150.

In the power module 3 according to the fourth embodiment, if an electriccurrent conducts between the drain and the source, an inductancecomponent between the source pad electrode SP and the source terminalST1 will electrify, and then a voltage applied between the gate thesource will be inhibited, and therefore a switch response becomes slowand the drain voltage change dV_(ds)/dt becomes small. Consequently, theerroneous turning-on does not easily occur originally due to theelectrification of source wiring since a divide value of voltage due toa feedback capacitance is suppressed and increase of the gate voltage issuppressed. However, also when the erroneous turning-on occurs, it canprevent from leading to the oscillation by the gated diode D_(G1).

According to the fourth embodiment, there can be provided the powercircuit and the power module for suppressing an induction from theerroneous turning-on to the parasitic oscillation.

Modified Example

FIG. 34A shows a schematic bird's-eye view configuration composed of ahybrid device in a power module 3 according to a modified example of thefourth embodiment, and FIG. 34B shows a schematic cross-sectionalstructure of a structure portion in which the diode is mounted on theMISFET Q1 in FIG. 34A. The circuit configuration is similarly shown asFIG. 33A. Although detailed structure is omitted in the MISFET Q1 shownin FIG. 34, the structure of the SIC based MISFET shown in FIGS. 2 and 3is applicable thereto.

As shown in FIGS. 34A and 34B, in the power module 3 according to themodified example of the fourth embodiment, the source pad electrode SPand the gate pad electrode GP of the MISFET Q1 are disposed at a frontsurface side, as shown in FIG. 34B, the anode of the gated diode DG1 isdisposed so as to be connected on the source pad electrode SP of theMISFET Q1, and the cathode K of the gated diode DG1 is connected to thegate pad electrode GP of the MISFET Q1 via the bonding wire BWGK.

In the power module 3 according to the modified example of the fourthembodiment, the gate G1 of the MISFET Q1 corresponds to the gate padelectrode GP, and the source sense SS1 of the MISFET Q1 corresponds tothe source pad electrode SP commonly connected to the source S.

Furthermore, the power module 3 according to the modified example of thefourth embodiment is contained in the package 150 (illustration isomitted) in the same manner as the fourth embodiment, between the sourcepad electrode SP and the source sense terminal SST1 is connected via abonding wire BW_(S1), between the gate pad electrode GP and the gateterminal GT1 is connected via a bonding wire BW_(G1). The metal die 140to which the drain of the MISFET Q1 is connected extends in thatcondition to form the diode terminal DT.

Also in the power module 3 according to the modified example of thefourth embodiment, the parasitic inductance concerned in the gateterminal GT1 and the source sense terminal SST1 can be reduced bydisposing the gated diode D_(G1) so as to be adjacent to the MISFET Q1,in the package 150. The control circuit may be built in another regionin the same chip as the MISFET Q1.

According to the modified example of the fourth embodiment, there can beprovided the power circuit and the power module for suppressing aninduction from the erroneous turning-on to the parasitic oscillation.

The power circuits and the power modules according to the first tofourth embodiments are applicable to converters and inverters forHEV/EV, motors built-in wheel (Power Factor Correction (PFC) circuitsand three phase inverter circuits for motor driving used for boostingfrom batteries), converters for power conditioners of solar batterysystems, converters and inverters for industrial equipment, etc. Inparticular, the power circuits and power modules according to first tofourth embodiments are effectively applicable to converters andinverters with which a high-frequency operation and a miniaturizationare required in order to miniaturize the passive element.

As explained above, according to the embodiments, there can be providedthe power circuit capable of reducing the misoperation and the parasiticoscillation and further capable of realizing the high speed switchingperformance; and the power module in which such a power circuit ismounted.

Other Embodiments

The first to fourth embodiments have been described, as a disclosureincluding associated description and drawings to be construed asillustrative, not restrictive. This disclosure makes clear a variety ofalternative embodiment, working examples, and operational techniques forthose skilled in the art. Moreover, the same effect can be obtained bytaking same countermeasure also using a power circuit or power module inwhich only patterns are prepared with metallic plates or metallicframes, without using the main substrate, and the arrangementrelationship holding and insulating holding between the patterns whichare roles of the main substrate are realized with resin sealing,insulating sheets, etc.

Such being the case, the embodiment covers a variety of embodiments,whether described or not.

INDUSTRIAL APPLICABILITY

The power module and power circuit according to the embodiments areavailable to whole of power devices, e.g. SiC power modules, intelligentpower modules, and are applicable to in particular wide applicablefields, e.g., converters and inverters for HEV/EV, motors built-in wheel(PFC circuits and three phase inverter circuits for motor driving usedfor boosting from batteries), step-up (boost) converters used for powerconditioners of solar battery systems, converters and inverters forindustrial equipment, etc.

What is claimed is:
 1. A power module comprising: a main substratecomprising a front side surface; a first wiring pattern disposed on thefront side surface of the main substrate; a second wiring patterndisposed on the front side surface of the main substrate; a first MISFETof which a first drain is disposed on the first wiring pattern, thefirst MISFET comprising a source electrode and a gate electrode on anupper surface thereof; a first pillar connection electrode electricallyconnected to the source electrode of the first MISFET; a plate electrodeelectrically connected to the first pillar connection electrode, theplate electrode covering the first pillar connection electrode so thatthe gate electrode is exposed from the plate electrode; and a gatecontrol conductive portion electrically connected between the gateelectrode, exposed from the plate electrode, of the first MISFET and thesecond wiring pattern, wherein a drain electrode of the first MISFET isdisposed at a lower portion of the first MISFET, the source electrode ofthe first MISFET is disclosed at an upper portion of the first MISFET,and a current flows from the first drain toward a first source of thefirst MISFET when the first MISFET is turned on.
 2. The power moduleaccording to claim 1, wherein the gate control conductive portion is awire.
 3. The power module according to claim 2, wherein the plateelectrode is electrically connected to a source lead terminal of thepower module.
 4. The power module according to claim 3, wherein aconductive material is provided between the first wiring pattern and thefirst MISFET.
 5. The power module according to claim 4, wherein aconductive material is provided between the first pillar connectionelectrode and the source electrode of the first MISFET.
 6. The powermodule according to claim 5, wherein a height of the wire is not higherthan a height of the plate electrode.
 7. The power module according toclaim 6, wherein the first wiring pattern and the second wiring patternare isolated electrically.
 8. The power module according to claim 7,wherein the first wiring pattern is electrically connected to a drainlead terminal.
 9. The power module according to claim 8, wherein both ofthe source lead terminal and the drain lead terminal are protruding inopposite directions from one another.
 10. The power module according toclaim 9, further comprising: a second MISFET having a source electrodeand a gate electrode; a second pillar connection electrode; a thirdwiring pattern disposed on the front side surface of the main substrate;wherein the second pillar connection electrode is electrically connectedto the source electrode of the second MISFET, and the second MISFET iselectrically connected to the third wiring pattern.
 11. The power moduleaccording to claim 10, wherein both of the first MISFET and the secondMISFET are controlled in a manner so that a same voltage potential isprovided to the gate electrode of the first MISFET and to the gateelectrode of the second MISFET.
 12. A power module comprising: a mainsubstrate comprising a front side surface; a first wiring patterndisposed on the front side surface of the main substrate; a secondwiring pattern disposed on the front side surface of the main substrate;a first MISFET of which a first drain is disposed on the first wiringpattern, the first MISFET comprising a source electrode and a gateelectrode on an upper surface thereof; a first pillar connectionelectrode electrically connected to the source electrode of the firstMISFET; a plate electrode electrically connected to the first pillarconnection electrode, the plate electrode covering the first pillarconnection electrode, and in a top view a portion of the gate electrodeis not covered by the plate electrode; and a gate control conductiveportion electrically connected between the gate electrode of the firstMISFET and the second wiring pattern, wherein a drain electrode of thefirst MISFET is disposed at a lower portion of the first MISFET, thesource electrode of the first MISFET is disclosed at an upper portion ofthe first MISFET, and a current flows from the first drain toward afirst source of the first MISFET when the first MISFET is turned on. 13.The power module according to claim 12, wherein the gate controlconductive portion is a wire.
 14. The power module according to claim12, wherein the plate electrode is electrically connected to a sourcelead terminal of the power module.
 15. The power module according toclaim 12, wherein a conductive material is provided between the firstwiring pattern and the first MISFET.
 16. The power module according toclaim 12, wherein a conductive material is provided between the firstpillar connection electrode and the source electrode of the firstMISFET.
 17. The power module according to claim 13, wherein a height ofthe wire is not higher than a height of the plate electrode.
 18. Thepower module according to claim 12, wherein the first wiring pattern andthe second wiring pattern are isolated electrically.
 19. The powermodule according to claim 14, wherein the first wiring pattern iselectrically connected to a drain lead terminal.
 20. The power moduleaccording to claim 19, wherein both of the source lead terminal and thedrain lead terminal protrude in opposite directions from one another.